Work

Understanding molecular weight effects in polymer photoresists and how variations in molecular weight can affect dissolution rates

Year: 2024

Type: conference-paper

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.3035361

Authors: Amir Hegazy, Christian Francisco, Amanda Berryman, Gregory Denbeaux

Institutions: State University of New York, University at Albany, State University of New York

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403051841

FWCI:

Cites: 3

Cited by:

Related to: 10