Direct laser writing of volumetric photonic integrated circuits (VPICs) for optical and quantum computing
Year: 2024
Type: conference-abstract
Abstract: Here, we present Subsurface Controllable Refractive Index via Beam Exposure (SCRIBE), a direct-write lithographic approach that enables fabrication of low-loss volumetric microscale gradient refractive index lenses, waveguides, and metamaterials. The basis of SCRIBE is multiphoton polymerization inside monomer-filled nanoporous silicon and silica scaffolds. Adjusting the laser exposure during printing enables 3D submicron control of the polymer infilling and thus the refractive index over a range of greater than 0.3 and chromatic dispersion tuning. A Luneburg lens operating at visible wavelengths, achromatic doublets, multicomponent optics, photonic nanojets and subsurface 3D waveguides were all formed. Various optical elements were combined to create the building blocks for volumetric photonic integrated circuits.
Source: Active Photonic Platforms (APP)
DOI: 10.1117/12.3027353
Author: Paul V. Braun
Institution: University of Illinois System
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
OpenAlex ID: W4403061042