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Enhancing mask process correction on curvilinear data with Bézier curve representation

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3034585

Authors: Ai Kaneko, Yohei Sogabe, So Yanaihara, Toshikazu Nagatani, Taigo Fujii, Tomokazu Hayashi, Masakazu Hamaji

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403184391

FWCI: 2.335

Cites: 5

Cited by: 3

Related to: 10