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Rhombohedral R 3 Phase of Mn‐Doped Hf 0.5 Zr 0.5 O 2 Epitaxial Films with Robust Ferroelectricity

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Year: 2024
Type: article
Source: Advanced Materials
DOI: 10.1002/adma.202406038
Authors: Jiasheng Guo, Lei Tao, Xing Xu, Lingxuan Hou, Ce‐Wen Nan, Shixuan Du, Chonglin Chen, Jing Ma
Institutions: State Key Laboratory of New Ceramics and Fine Processing, Tsinghua University, Chinese Academy of Sciences, Institute of Physics, University of Chinese Academy of Sciences, The University of Texas at San Antonio, Songshan Lake Materials Laboratory
Language: English

Topic: Ferroelectric and Negative Capacitance Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China
Awards: G2430748209, G2853204155, G6600486544
OpenAlex ID: W4403262893
FWCI: 2.878
Cites: 52
Cited by: 28
Related to: 10
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