Work

Pressure resistance of photoresist and substrate in contact lithography

Year: 2024

Type: conference-paper

DOI: 10.1117/12.3036319

Authors: Changfeng Shao, Fuyuan Deng, Tianshi Lu

Institution: Tsinghua University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403288296

FWCI:

Cites: 20

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Related to: 10