Computing method for extreme ultraviolet lithography imaging with aberration consideration
Year: 2024
Type: conference-paper
DOI: 10.1117/12.3036144
Authors: Guojin Li, Changwei Zhang, Zhenrong Zheng
Institution: Zhejiang University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4403288531