Formation of n-type polycrystalline silicon with controlled doping concentration by flash lamp annealing of catalytic CVD amorphous silicon films
Year: 2024
Type: article
Authors: Zheng Wang, Huynh Thi Cam Tu, Keisuke Ohdaira
Institution: Japan Advanced Institute of Science and Technology
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4403288763