Work

Measurement of 13.5nm 2%BW in-band EUV power based on HCT-DPP source

Year: 2024

Type: conference-paper

DOI: 10.1117/12.3037536

Authors: Jiale Zheng, Chenhao Zhou, Haoxuan Xiao, Kunwei Guo, Xiao Ling, Tenfeng Yan, Jianhua Zhang

Institution: Shanghai University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403326585

FWCI:

Cites: 12

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Related to: 10