Work

Effect of post-deposition annealing on crystal structure of RF magnetron sputtered germanium dioxide thin films

Year: 2024

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0003960

Authors: Ahmad Matar Abed, Rebecca L. Peterson

Institution: University of Michigan

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, National Science Foundation Graduate Research Fellowship Program

Awards: G479929807, FuSe-TG: Co-Design of Germanium Oxide-based Semiconductors from Deposition to Devices, Collaborative Research: FuSe: GeSnO2 Alloys for Next-Generation Semiconductor Devices

OpenAlex ID: W4403337488

FWCI: 1.645

Cites: 26

Cited by: 16

Related to: 10