Trace Cu‐Induced Low C─N Coupling Barrier on Amorphous Co Metallene Boride for Boosting Electrochemical Urea Production
Year: 2024
Type: article
Source: Small
Authors: Yueji Wu, Han Lin, Qiqi Mao, Hongjie Yu, Kai Deng, Jianguo Wang, Liang Wang, Ziqiang Wang, Hongjing Wang
Institution: Zhejiang University of Technology
Language: English
Field: Energy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4403353267
