Work

Ruthenium catalyst processing and oxidation for scalable complementary metal-oxide-semiconductor-compatible metal-assisted chemical etch

Year: 2024

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.23.4.043601

Authors: Mark Hrdy, Akhila Mallavarapu, Raul Lema Galindo, S.V. Sreenivasan

Institutions: Texas Materials Institute, The University of Texas at Austin, University of Pennsylvania

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403353642

FWCI: 0.104

Cites:

Cited by: 1

Related to: 10