Work

Robust edge photogalvanic effect in thin-film WTe2

Year: 2024

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0235287

Authors: Yang Zhang, Jia-Le Wang, Xiao-Lan Xue, Yue Nie, Dan-Ni Shi, Shao-Bo Zhang, Ling-Xiu Chen, Li-Wei Shi

Institutions: China University of Mining and Technology, Yangzhou University

Language: English

Topic: Topological Materials and Phenomena

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Jiangsu Province, Xuzhou Science and Technology Program

Awards: G416540397, G5360166682, G6798224436, G6877265429

OpenAlex ID: W4403401363

FWCI: 1.114

Cites: 27

Cited by: 7

Related to: 10