Work

Subdiffraction‐Limited Motheye‐Like Metastructures Fabrication by Dual‐Beam Overexposure Methodology Enhancing Broadband Infrared Antireflective Application (Advanced Optical Materials 29/2024)

Year: 2024

Type: article

Abstract: Motheye-Like Metastructures with Broadband Infrared Antireflectivity Materials possessing broadband antireflective properties benefit applications of military camouflage, photovoltaic devices, and highly transparent windows. In this work (see article number 2401341 by Zeyu Zhao, Xiangang Luo, and co-workers), large-area subdiffraction-limited motheye-like metastructures with broadband infrared antireflectivity are realized by dual-beam overexposure shrinking strategy and controllable anisotropic reactive ion etching process. A reflectivity across the overall spectrum of 3–12 µm lower than 2.0% is demonstrated.

Source: Advanced Optical Materials

DOI: 10.1002/adom.202470090

Authors: Peng Ran, Qingsong Wang, Jiong Wang, Wenbo Chen, Zeyu Zhao, Xiaoliang Ma, Xiong Li, Mingbo Pu, Xiangang Luo

Institutions: Chinese Academy of Sciences, Institute of Optics and Electronics, Chinese Academy of Sciences, University of Chinese Academy of Sciences

Language: English

Topic: Optical Coatings and Gratings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4403433090

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