Work

Deep cryogenic silicon etching for 3D integrated capacitors: A numerical perspective

Year: 2024

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0003966

Authors: M. K. Rudenko, A. V. Miakonkikh, K. V. Rudenko

Institutions: Russian Academy of Sciences, Institute of Physics and Technology

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Russian Science Foundation

Award: G2338397462

OpenAlex ID: W4403450741

FWCI: 0.312

Cites: 53

Cited by: 3

Related to: 10