Leaching Mechanism for Chalcopyrite in Electrochemically Regenerated Vanadium(II)
Year: 2024
Type: article
Authors: Tongwei Xu, Brian Donovan, Charles Kim, Scott Banta, Jeffrey P. Fitts, Alan C. West
Institution: Columbia University
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G7012909253
OpenAlex ID: W4403494093