Regulating Zn Deposition Manner by Confining the Reactivity of Free Water in the Electric Double Layer
Year: 2024
Type: article
Source: Chemistry - A European Journal
Authors: Guoli Liao, Yufei Zhang, Minghui Ye, Yongchao Tang, Zhipeng Wen, Wencheng Du, Xiaoqing Liu, Cheng Chao Li
Institutions: Guangdong University of Technology, Guangzhou University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4403501210
