Work

Plasmonic lithography fast imaging model based on least square fitting for periodic patterns

Year: 2024

Type: article

Source: Applied Optics

DOI: 10.1364/ao.533329

Authors: Huwen Ding, Lisong Dong, Ziqi Li, Jianfang He, Le Ma, Dinghai Rui, Yayi Wei

Institutions: Chinese Academy of Sciences, University of Chinese Academy of Sciences, Guangdong Greater Bay Area Institute of Integrated Circuit and System

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Key Laboratory of Highway Construction and Maintenance Technology in the Loess Region of Shanxi Transportation Research Institute, University of Chinese Academy of Sciences, Fundamental Research Funds for the Central Universities

Awards: G2652754060, G3307631189, G4969306500

OpenAlex ID: W4403639293

FWCI: 0.208

Cites: 21

Cited by: 2

Related to: 10