Work

The Model Development for Optimizing the Line Edge Roughness in Double Patterning Process

Year: 2024

Type: conference-paper

Abstract: In this paper, we analyzed the influence of various parameters on the line edge roughness (LER) for double patterning process and investigated the dependence of the post exposure baking (PEB) temperature on the critical dimension (CD) of lines and on the LER.

Source: International Conference on Mathematical Modeling in Materials Science of Electronic Components (MMMSEC)

DOI: 10.29003/m4272.mmmsec-2024/102-105

Authors: Elena Tikhonova, Yevgeniy Gornev

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4403674196

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