Layout Dependent Effect Analysis and Modeling for Comprehensive, Practical Layout Patterns in 18nm FDSOI Technology
Year: 2024
Type: conference-paper
Authors: Dongwoo Lim, Hyotae Choo, Jooyoung Song, Sungjae Lee
Institution: Samsung (South Korea)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4403675864