Work

Integration of GAA Monolayer MoS2 Nanosheet FETs with Gate First Process for Future 2D CFET Scaling

Year: 2024

Type: conference-paper

DOI: 10.1109/esserc62670.2024.10719449

Authors: Fengben Xi, Himanshu Sharma, Xiangyu Wu, Tom Schram, Daire Cott, Robert K. Grubbs, Pawan Kumar, Tien Dat Ngo, Souvik Ghosh, Fei Han, Dennis Van Dorp, Devin Verreck, Surajit Sutar, Quentin Smets, Dennis Lin, Kaustuv Banerjee, Cesar Javier Lockhart De La Rosa, Ludovic Goux, Gouri Sankar Kar

Institution: IMEC

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Graphene Flagship

OpenAlex ID: W4403677884

FWCI: 17.59

Cites: 19

Cited by: 9

Related to: 10