Work

Scanning Capacitance Microscopy Application for Top-down Sample Failure Analysis on SOI and Bulk Silicon Wafers

Year: 2024

Type: conference-paper

Source: Proceedings - International Symposium for Testing and Failure Analysis

DOI: 10.31399/asm.cp.istfa2024p0370

Authors: Zin Nwe Tun, Ryan Sweeney, Kevin Davidson, Esther Chen

Institution: GlobalFoundries (United States)

Language: English

Topic: Integrated Circuits and Semiconductor Failure Analysis

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403685175

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