Work

The Impact of TEM Analysis Temperature on Photoresist Profiles Using Cryo-FIB and Cryo-TEM

Year: 2024

Type: conference-paper

Source: Proceedings - International Symposium for Testing and Failure Analysis

DOI: 10.31399/asm.cp.istfa2024p0221

Authors: Ji Hye Hyun, Yanchao Dai, In Chang Choi, Christopher H. Kang

Institution: Thermo Fisher Scientific (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403685299

FWCI:

Cites:

Cited by:

Related to: 10