Work

Simple Smoothing of the Bottom Silicon Surface Using Wet Chemical Etching Methods for Epitaxial III‐V/Silicon Tandem Manufacturing

Year: 2024

Type: article

Source: Energy Technology

DOI: 10.1002/ente.202401322

Authors: Mengmeng Chu, Junhan Bae, Muhammad Quddamah Khokhar, Alamgeer, Maha Nur Aida, Vinh‐Ai Dao, Duy Phong Pham, Sangheon Park, Junsin Yi

Institutions: Sungkyunkwan University, Ho Chi Minh City University of Technology and Engineering

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: closed

Funder: Ministry of Trade, Industry and Energy

Awards: G1816135413, G4580871976

OpenAlex ID: W4403776148

FWCI: 0.208

Cites: 28

Cited by: 2

Related to: 10