E-beam Lithography Technology for Quantum Device Fabrication and Nanoscale Patterning
Year: 2024
Type: article
Source: Physics and High Technology
DOI: 10.3938/phit.33.024
Authors: Seok-kyu KIM, Kang min YOO, Hyeon seok JEONG, Moon gyu JANG
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4403821289