Work

Deposition of nanocomposite carbon-based thin films doped with copper and fluorine

Year: 2024

Type: article

Abstract: This paper is focused on plasma-enhanced chemical vapor deposition (PECVD) of novel carbon-based thin films . Unique thin films were deposited from a mixture of methane, hydrogen, and a precursor containing fluorine and copper: (hfac)copperVTMS (hfac = hexafluoroacetylacetonato and VTMS = vinyltrimethylsilane). Using the (hfac)copperVTMS precursor in PECVD deposition results in the advantageous chemical composition of carbon-based thin films while maintaining sufficient mechanical properties. Furthermore, with optimized plasma parameters, the films deposited on the substrate exhibit a nanocomposite structure. This nanostructured surface can increase the surface area, which is beneficial for various applications, including antibacterial and antiviral properties. The radiofrequency glow discharge at low pressure ( ≈ 70 Pa ) and power P = 25 W and P = 250 W was used for deposition. Deposited thin films were analyzed using X-ray photoelectron spectroscopy , water contact angle measurement, atomic force microscopy , and nanoindentation techniques. Despite the doping of carbon-based thin films with soft copper, the prepared films exhibited sufficient mechanical properties, which are crucial for the future implementation of this deposition process .

Source: Carbon Trends

DOI: 10.1016/j.cartre.2024.100416

Authors: R. Pribyl, S. Kelarova, M. Karkus, V. Bursikova

Institution: R&D Centre for Low-Cost Plasma and Nanotechnology Surface Modifications

Language: English

Topic: Diamond and Carbon-based Materials Research

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $1,610

Funders: Technology Agency of the Czech Republic, Ministerstvo Školství, Mládeže a Tělovýchovy, Central European Institute of Technology