Work

Influence of Ge Concentration and Deposition Temperature on the Photoresponse Characteristics of Ge:SiO2 Nanocomposite Thin Films

Year: 2024

Type: conference-paper

Source: CAS proceedings

DOI: 10.1109/cas62834.2024.10736851

Authors: I. Stavarache, P. Prepelita, O. Cojocaru, M. L. Ciurea

Institutions: National Institute of Materials Physics, National Institute for Laser Plasma and Radiation Physics

Language: English

Topic: Photonic and Optical Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4403937112

FWCI: 0.806

Cites: 8

Cited by: 1

Related to: 10