Work

Analysis of Fabrication Techniques for Thin Film Schottky Diode for 5G and Beyond

Year: 2024

Type: conference-paper

DOI: 10.1109/iceect61758.2024.10739111

Authors: Shilpa Srivastava, Usha Tiwari, Mohit Sahni, Manisha Rajoriya

Institution: Sharda University

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404035775

FWCI:

Cites: 20

Cited by:

Related to: 10