Germanium surface segregation in highly doped Ge:β-Ga2O3 grown by molecular beam epitaxy observed by synchrotron radiation hard x-ray photoelectron spectroscopy
Year: 2024
Type: article
Source: Applied Physics Letters
DOI: 10.1063/5.0220212
Institutions: Centre National de la Recherche Scientifique, Commissariat à l'Énergie Atomique et aux Énergies Alternatives, Université Paris-Saclay, CEA Paris-Saclay - Etablissement de Saclay, CEA Paris-Saclay, Wright-Patterson Air Force Base, U.S. Air Force Research Laboratory Materials and Manufacturing Directorate, Azimuth (United States), National Institute of Standards and Technology, Material Measurement Laboratory
Language: English
Topic: Ga2O3 and related materials
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Award: G2070621287
OpenAlex ID: W4404040214
