Work

XeF 2 gas assisted focused electron beam induced etching of niobium thin films: towards direct write editing of niobium superconducting devices

Year: 2024

Type: article

Source: Nanoscale Horizons

DOI: 10.1039/d4nh00407h

Authors: Spencer Gellerup, Reece Emery, Scott T. Retterer, Steven J. Randolph, Philip D. Rack

Institutions: University of Tennessee at Knoxville, Oak Ridge National Laboratory, Center for Nanophase Materials Sciences

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: U.S. Department of Energy

OpenAlex ID: W4404067874

FWCI: 0.72

Cites: 37

Cited by: 7

Related to: 10