Work

Atomic-layer-deposited Al2O3 as a barrier to thermal and plasma oxidations

Year: 2024

Type: conference-paper

Abstract: International audience

Source: HAL (Le Centre pour la Communication Scientifique Directe)

Authors: Drob, Manon, Dubreuil, Pascal, Calvez, Stéphane

Institution: Laboratoire d'Analyse et d'Architecture des Systèmes

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W4404166974

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Related to: 10