Development and optimization of metal silicide EUV pellicle for 400W EUV lithography
Year: 2024
Type: article
Source: Nanotechnology
Authors: Munsu Choi, Chulkyun Park, Juhee Hong
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4404170915