Work

Understanding and measuring EUV mask 3D effects

Year: 2024

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.23.4.041407

Authors: Stuart Sherwin, Matt Hettermann, Dave Houser, Patrick P. Naulleau

Institution: EUV Labs (Russia)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404185683

FWCI: 0.411

Cites: 11

Cited by: 4

Related to: 10