Development of Electron Beam Physical Vapor Deposition Coating Process for YSZ Material Using Domestic Equipment Technology
Year: 2024
Type: article
Abstract: In this study, we developed domestic hardware and process technology related to EB-PVD(Electron Beam Physical Vapor Deposition) technology and succeeded in manufacturing YSZ(Yttria Stabilized Zirconia) coating with a columnar structure.The columnar structure of the EB-PVD coating changes sensitively depending on the surface roughness and movement of the substrate during the process.The roughness(Ra less than 0.1 to 4 μm) and rotation speed(0~360 ° /s) of the substrate for the coin-shaped test specimen were confirmed.The microstructure was obtained according to the variable(360 ° /s) and angle(0, 30 ° ).As a result, when the roughness of the substrate surface was Ra 0.1 μm or less and the rotation speed was 300 ° /s, a process with a uniform column structure and the best straightness was derived.In addition, based on the process data obtained in this study, we succeeded in producing a prototype of EB-PVD coating on the turbine blade shape.The average thickness of YSZ deposited on the airfoil was about 158 ㎛, and deviations were within 10 ㎛, resulting in a uniform coating.초 록 본 연구에서는 전자빔 물리기상 증착(EB-PVD: Electon-Beam Physical Vapor Deposition) 기술과 관련하 여, 국내 하드웨어 및 공정기술을 개발함으로써 주상구조를 가지는 YSZ(Yttria-stabilized zirconia) 코팅을 제 작하는데 성공하였다.EB-PVD 코팅의 주상구조는 기판의 표면조도와 공정 중 기판의 회전 및 기울임 운동에 민감하게 변화하는 것을 확인하였으며 본 연구에서는 코인형 시험편에 대해 기판의 거칠기(Ra 0.1~4 ㎛), 회전 속도(0~360 ° /s)와 각도(0, 30 ° ) 변수에 따른 미세조직을 획득하였다.그 결과, 주상구조가 균일하고 직진성이 가 장 우수하게 나타난 공정은 기판 표면의 거칠기가 Ra 0.1 ㎛ 미만이고 회전속도가 300 ° /s인 경우로 도출되었다.
Authors: Keekeun Kim, Chungryeol Lee, Sangmoon Lee, Ilsun Hong, Youil Kim, Jinhyung Kim
Institution: Agency for Defense Development
Language: English
Subfield: Aerospace Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W4404193523