Work

Low volume shrinkage, alkaline degradable UV nanoimprint lithography resists based on acrylic anhydride

Year: 2024

Type: article

Source: Nanoscale

DOI: 10.1039/d4nr03291h

Authors: Chuan-Zhe Zhao, Ya-Juan Cai, Yi-Xing Sun, Ya-Ge Wu, Ke-xiao Sang, Ting Yue, Zi-Hao Yang, Jing-Gang Gai

Institutions: Sichuan University, State Key Laboratory of Polymer Materials Engineering

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, State Key Laboratory of Polymer Materials Engineering, Sichuan Province Science and Technology Support Program

Awards: G1809245838, 超高分子量聚乙烯加工改性的耗散粒子动力学理论及平均场理论研究, G2935281146, 超快水传输石墨烯正渗透膜的分离机制研究

OpenAlex ID: W4404246168

FWCI: 0.627

Cites: 32

Cited by: 6

Related to: 10