Work

Intrinsically Photopatternable High‐k Polymer Dielectric for Flexible Electronics (Adv. Funct. Mater. 47/2024)

Year: 2024

Type: article

Abstract: Flexible Electronics In article number 2405530, Hyun You Kim, Hyun-Suk Kim, Kyung Jin Lee, and co-workers present a parylene-OH polymeric thin film, synthesized via a CVD process, that exhibits unique intrinsic photo-patternable properties, offering exceptional dielectric performance and flexible durability. The illustration suggests that parylene-OH deposited through CVD can be easily photo-patterned by simply irradiating it with 254 nm UV light, followed by an organic solvent rinse, resulting in high-resolution patterning.

Source: Advanced Functional Materials

DOI: 10.1002/adfm.202470280

Authors: Gunoh Lee, Seong Cheol Jang, Ju Hyeok Lee, Ji‐Min Park, Byeongil Noh, Hyuk Choi, Hyukmin Kweon, Do Hwan Kim, Hyun You Kim, Hyun‐Suk Kim, Kyung Jin Lee

Institutions: Chungnam National University, Dongguk University, Hanyang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4404322304

FWCI: 0.82

Cites:

Cited by: 8

Related to: 10