Work

RuleLearner: OPC Rule Extraction From Inverse Lithography Technique Engine

Year: 2024

Type: article

Source: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

DOI: 10.1109/tcad.2024.3499909

Authors: Ziyang Yu, Su Zheng, Wenqian Zhao, Shuo Yin, Xiaoxiao Liang, Guojin Chen, Yuzhe Ma, Bei Yu, Martin D. F. Wong

Institutions: Chinese University of Hong Kong, Hong Kong University of Science and Technology, The Hong Kong University of Science and Technology (Guangzhou)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404411236

FWCI: 0.308

Cites: 35

Cited by: 3

Related to: 10