Assessing Copper High Density-TSVs for Reliable Performance in Cryogenic Systems
Year: 2024
Type: article
Source: IEEE Electron Device Letters
Authors: Stéphane Moreau, Candice Thomas, David Bouchu
Language: English
Topic: 3D IC and TSV technologies
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: Agence Nationale de la Recherche
Award: NANOELEC
OpenAlex ID: W4404479862
