Effect of discharge pulse frequency on the microstructure and field-emission performance of CNX films deposited by pulse cathode arc evaporation
Year: 2024
Type: article
DOI: 10.1116/6.0003974
Authors: Haowei Du, Bing Zhou, D. G. Piliptsou, Hui Sun, Yong Ma, Hongjun Hei, Shengwang Yu, Zhubo Liu
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: G1508044499, G7380637590, G8697947614
OpenAlex ID: W4404499139
