Work

Effectuality of frequency dependent dielectric characterization of (N:DLC) film deposition between the metal-semiconductor interface

Year: 2024

Type: article

Source: Physica B Condensed Matter

DOI: 10.1016/j.physb.2024.416753

Authors: N. Urgun, S.O. Tan, A. Feizollahi Vahid, B. Avar, Ş. Altındal

Institutions: Karabük University, Zonguldak Bülent Ecevit University, Gazi University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404503994

FWCI: 0.934

Cites: 74

Cited by: 9

Related to: 10