Reliable Simulation Analysis of Interface and SiON Degradation Effects on Water Vapor Barrier in Laminated Thin‐Film Encapsulation
Year: 2024
Type: article
Source: physica status solidi (a)
Authors: Xianwen Liu, Tao Sun, Xuyang Li, Bin Liu, Qi Yao, Shuo Zhang, Zongchi Bao, Feng Wang, Tao Wang, Rui Hong, Anyuan Qiu, Zhinong Yu
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4404513050
