Reactive magnetron sputtering: a powerful tool to design ternary photocatalysts in thin films.
Year: 2024
Type: conference-paper
Authors: Bousquet, A., Ibrahim, S., Bonnet, P., Granvalet, M. Le, Richard-Plouet, M., Roth, S., Pagis, C., Bonduelle, A.
Institutions: Institut Pascal, Institut de Chimie de Clermont-Ferrand
Language: English
Field: Energy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4404531151
