Polarization-insensitive bifocal metalenses by combining nanoimprint lithography and atomic layer deposition in the visible spectrum
Year: 2024
Type: article
Source: Applied Physics Letters
DOI: 10.1063/5.0231919
Authors: Xu Mao, Gang Yu, Fuhua Yang, Xiaodong Wang
Institutions: Chinese Academy of Sciences, Institute of Semiconductors
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4404540171