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Integrated mask process modeling for better yield predictions

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3035191

Authors: Abdalaziz Awad, Cyrus Behroozi, Andreas Erdmann

Institutions: Google (United States), Friedrich-Alexander-Universität Erlangen-Nürnberg, Fraunhofer Institute for Integrated Systems and Device Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404556861

FWCI: 0.779

Cites: 4

Cited by: 1

Related to: 10