Work

Towards a 1000W-compatible EUV pellicle

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3034637

Author: Mark van de Kerkhof

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4404556887

FWCI: 1.562

Cites: 19

Cited by: 2

Related to: 10