Work

Damage Accumulation in Alpha Gallium Oxide during Sequential keV Light Ion Implantations

Year: 2024

Type: conference-paper

Source: International Conference on Electrical Engineering and Photonics (EExPolytech)

DOI: 10.1109/eexpolytech62224.2024.10755933

Authors: Anton I. Klevtsov, Roman V. Kleimanov, Alexander Azarov, Platon A. Karaseov, Konstantin V. Karabeshkin, Andrey I. Titov

Institutions: Peter the Great St. Petersburg Polytechnic University, University of Oslo

Language: English

Topic: Ga2O3 and related materials

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Russian Science Foundation

OpenAlex ID: W4404564497

FWCI:

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