Work

Ar/CF4 capacitively coupled plasma generated using 40 MHz sinusoidal and 800 kHz rectangular waveform voltages

Year: 2024

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/1361-6595/ad95b9

Authors: Shahid Rauf, Sathya Ganta, Xingyi Shi, Kallol Bera, Jason Kenney

Institution: Applied Materials (United States)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404581820

FWCI: 0.411

Cites: 68

Cited by: 4

Related to: 10