Work

Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging

Year: 2024

Type: conference-paper

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.3035360

Authors: Parul Dhagat, Sofia Leitao, Nadia D. Rivera Torres, Guido Schiffelers, David Rio, Cyrus Tabery

Institutions: ASML (Netherlands), ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404585211

FWCI: 1.56

Cites: 8

Cited by: 2

Related to: 10