Work

High‐Throughput Multiplexed Plasmonic Color Encryption of Microgel Architectures via Programmable Dithering‐Mask Flow Microlithography

Year: 2024

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.202405388

Authors: Byungcheon Yoo, Chaeyeong Ryu, Seunghwan Lee, Sanggyun Jeong, Younghoon You, Dahye Baek, Dowon Kim, Inkyu Jeon, Ki‐Seok An, Jongwon Oh, Jiseok Lee

Institutions: Ulsan National Institute of Science and Technology, Korea Research Institute of Chemical Technology, University of Chicago

Language: English

Topic: Gold and Silver Nanoparticles Synthesis and Applications

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Korea Research Institute of Chemical Technology, National Research Foundation of Korea, Ministry of Science and ICT, South Korea

Awards: G2379784080, G2652983177, G3519882798, G5761180025

OpenAlex ID: W4404602153

FWCI: 0.848

Cites: 43

Cited by: 11

Related to: 10