Work

Sub-20-nm tip-to-tip enabled by anti-spacer patterning

Year: 2024

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.1.011004

Authors: Jodi Grzeskowiak, Michael Murphy, David Power, Steven Grzeskowiak, Jacob Dobson, Andrew Weloth, Charlotte A. Cutler, Eric Liu, David Conklin, Anton Devilliers

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4404617439

FWCI:

Cites: 8

Cited by:

Related to: 10