Work

The influence of reflectivity on EUV lithography performance of low-n and binary masks for random logic via implementation

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3034348

Authors: Ling Ee Tan, Fergo Treska, Werner Gillijns, Jeroen Van de Kerkhove, Peter De Bisschop, Vicky Philipsen, Ryoung-Han Kim

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404632341

FWCI: 0.779

Cites: 15

Cited by: 1

Related to: 10